Tuesday, May 18, 2010

Technology: Progression/Obsession is the theme of this year’s Runway 3.0 fashion extravaganza.

“It’s the perfect setting for the event and our theme,” said Habes. “The designs will play with the ideas of extremes in fashion, the role of technology in our culture, and the revolutionary speed of progress in both fashion and the world around us.”

1. Turquoise 100% silk, one shoulder, tunic offers the perfect background for this ivory, tulle, tutu embedded with floral elements. Fiber Optic lights embedding throughout the tutu give an extra " LOOK AT ME !!!" excitement on the dance floor.

Amy Lee Reusch has appeared in numerous photo shoots for
local photographers was my choice for this look #4.
SUNY Oneonta '05
Buffalo State College '09
Art Education Cert. Program
Clarence Senior High School '02

Thank you Amy for being part of ricerafferty team @ Runway 3.0. We all benefited from your professional experience.

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